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Description: 2-Propanol 99,8
Catalog Number: 71009-372
Supplier: KMG

Description: Nitric acid 69,5%, Cleanroom® LP LP Electronic_industry
Catalog Number: 71009-340
Supplier: KMG

Description: Xylene (mixture of isomers) 99,00
Catalog Number: 71009-384
Supplier: KMG

Description: Sulfuric acid (≥ 95%) 96, Cleanroom® MB MB Electronic_industry
Catalog Number: 71009-532
Supplier: KMG

Description: Ammonia solution 29%, Cleanroom® MB MB Electronic_industry
Catalog Number: 71009-320
Supplier: KMG

Description: Ammonium fluoride 40% aqueous solution MB
Catalog Number: 89400-748
Supplier: KMG

Description: Isopropanol Cleanroom LP, IPA is used to rinse silicon wafers and to leave a clean dry residue free surface usually after organic stripping solutions, Formula: (CH3)2CHOH, CAS Number: 67-63-0, 4l
Catalog Number: KM431-200440
Supplier: KMG

Description: Buffered oxide etch 50:1
Catalog Number: 89400-756
Supplier: KMG

Description: Hydrochloric acid 37%, Cleanroom® LP Electronic_industry
Catalog Number: 71009-324
Supplier: KMG

Description: Hydrochloric acid 37% GB Electronic_industry
Catalog Number: 71009-358
Supplier: KMG

Description: Hydrogen peroxide 30,00 - 32,00% LP
Catalog Number: 71009-366
Supplier: KMG

Description: Acetone Cleanroom LP, can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead remover, Formula: CH3COCH3, CAS Number: 67-64-1, Polybottle, 4l
Catalog Number: KM402-200406
Supplier: KMG

Description: Hydrogen peroxide 30%, Gigabit® Electronic_industry
Catalog Number: 71009-336
Supplier: KMG

Description: Hydrogen peroxide 30%, Cleanroom® MB MB Electronic_industry
Catalog Number: 71009-334
Supplier: KMG

Description: Acetone 99,5, Cleanroom® LP Electronic_industry
Catalog Number: 71009-508
Supplier: KMG

Description: Chromium etchant CR-16
Catalog Number: 10803-036
Supplier: KMG

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