Sulfuric acid 50%, CMOS for the electronics industry, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
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Danger
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Management of Change (MOC) category = R
5253-09
JT5253-9EA
2732.54
USD
JT5253-9
Sulfuric acid 50%, CMOS for the electronics industry, J.T.Baker®
Sulfuric acid
Formula:
H₂SO₄ MW: 98.08 Boiling Pt: 330 Melting Pt: 10.38 Density: 1.1…1.4 g/cm³ (20 °C) Storage Temperature: Ambient |
MDL Number:
MFCD00064589 CAS Number: 7664-93-9 EINECS: 231-639-5 UN: 2796 ADR: 8 II |
Specification Test Results
For Microelectronic Use | |
Assay (H₂SO₄) | 49.0 - 51.0 % |
Color (APHA) | ≤10 |
Residue after Ignition | ≤3 ppm |
Chloride (Cl) | ≤1 ppm |
Nitrate (NO₃) | ≤0.2 ppm |
Phosphate (PO₄) | ≤0.5 ppm |
Trace Impurities - Aluminum (Al) | ≤0.100 ppm |
Arsenic and Antimony (as As) | ≤0.005 ppm |
Trace Impurities - Barium (Ba) | ≤1.000 ppm |
Trace Impurities - Boron (B) | ≤0.010 ppm |
Trace Impurities - Cadmium (Cd) | ≤0.500 ppm |
Trace Impurities - Calcium (Ca) | ≤1 ppm |
Trace Impurities - Chromium (Cr) | ≤0.500 ppm |
Trace Impurities - Cobalt (Co) | ≤0.500 ppm |
Trace Impurities - Copper (Cu) | ≤0.010 ppm |
Trace Impurities - Gallium (Ga) | ≤0.050 ppm |
Trace Impurities - Germanium (Ge) | ≤0.500 ppm |
Trace Impurities - Gold (Au) | ≤0.500 ppm |
Trace Impurities - Iron (Fe) | ≤0.2 ppm |
Trace Impurities - Lead (Pb) | ≤0.400 ppm |
Trace Impurities - Lithium (Li) | ≤1.000 ppm |
Trace Impurities - Magnesium (Mg) | ≤1.000 ppm |
Trace Impurities - Manganese (Mn) | ≤0.500 ppm |
Trace Impurities - Nickel (Ni) | ≤0.1 ppm |
Trace Impurities - Potassium (K) | ≤1.000 ppm |
Trace Impurities - Silicon (Si) | ≤0.500 ppm |
Trace Impurities - Silver (Ag) | ≤0.500 ppm |
Trace Impurities - Sodium (Na) | ≤1.000 ppm |
Trace Impurities - Strontium (Sr) | ≤0.500 ppm |
Trace Impurities - Tin (Sn) | ≤0.500 ppm |
Trace Impurities - Zinc (Zn) | ≤0.500 ppm |
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